Applied Materials’ Ion Source Development Group is searching for an intern to join our team in summer 2027! The Ion Source Development Group develops new technologies and explores new materials and designs to improve output, stability and lifetime for the ion sources used in ion implant tools. The position will entail the following: * Training to become familiar with the ion source technology and experimental procedures and tools. * Develop test plans to explore different aspects of source performance and run these on source test stands * Data acquisition and analysis from experiments * Conceptual design of new parts for improved performance * Presentation of results in a group environment 2027 Summer internship program start/end date: Monday, May 24 - Friday, August 13 Requirements * Student must be pursuing a Bachelor’s degree program or higher in Materials Science & Engineering, Physics, or a related field * Student must be in good academic standing at their university, with a preferred GPA of 3.0 or above on a 4.0 scale * Experience in semiconductor processing or manufacturing preferred * Quick learner * Coding experience in MATLAB, LABVIEW, or Python is preferred but not necessary Compensation: $31 - $50 per hour Applications will be reviewed on a rolling basis. Note: This position may close early based on application volume or candidate selection. ## Qualifications ### Education: ### Skills ### Certifications: ### Languages: ### Years of Experience: ### Work Experience: ## Additional Information ### ### Shift: 10-Day 8-Hr (United States of America) ### ### Travel: Yes, 10% of the Time ### ### Relocation Eligible: Yes ### Referral Payment Plan: None Applied Materials is an Equal Opportunity Employer committed to diversity in the workplace. All qualified applicants will receive consideration for employment without regard to race, color, national origin, citizenship, ancestry, religion, creed, sex, sexual orientation, gender identity, age, disability, veteran or military status, or any other basis prohibited by law.